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Degradation Analysis

Modern device structures in micro and nanotechnology are just 350 to 40 nm in size. To satisfy the future demands for highest performance at lowest power budgets, they will further decrease down to 130 to 10 nm. The field of system integration is also constantly advancing, and components are now being packed into the tightest of arrangements with new processes and materials involved. As a result, the reliable functioning of a part is increasingly influenced by parasitic technological effects such as process fluctuations, aging or electro-thermal interactions with other components.

 

Top: Gate voltage of a transistor as a function of time. Voltage overshoots may have a significant impact on degradation.  Bottom:<b. Resulting threshold voltage shift due to NBTI degradation, including recovery effects.

Image 1:

Top: Gate voltage of a transistor as a function of time. Voltage overshoots may have a significant impact on degradation.

Bottom: Resulting threashold voltage shift due to NBTI degradation, including recovery effects.

 

 

 

RelXpert model development of Fraunhofer IIS/EAS assist designers to quickly verify a design after many years of operation

Image 2:

RelXpert model development of Fraunhofer IIS/EAS assist designers to quickly verify a design after many years of operation.

 

 

 

 

Frequency degradation of a ring oscillator after 4 years of operation.

Image 3:

Frequency degradation of a ring oscillator after 4 years of operation.

 

 

Many new safety-critical applications, such as in automobiles, aviation, medical technology or industrial automation, are based on these technologies. These applications require parts with particularly long lifetimes that must still be inexpensive to manufacture.

Fraunhofer IIS/EAS offers a range of software tools and services for supporting design of reliable components. Master with them effects such as process variations or aging caused by technology quickly and reliably. This is how costs can be reduced in the production process and field returns be avoided by product quality improvement.

Benefits

  • Components and systems adapted ideally to the application
  • High production yield
  • Avoidance of re- and overdesign
  • Confirmed compliance to qualification requirements

Services

  • Creation of aging models using measured qualification data
  • Integration of aging models in existing design tools and flows
  • Modeling of manufacturing variations across several levels of hierarchy
  • Fault modeling and evaluation of fault tolerance measures
  • Optimal sizing of interconnects and vias with respect to electro migration and thus for achieving the specified lifetime
  • Linking SPICE-like circuit simulation and device simulation

Approach

In order to reliably guarantee the functioning of components and to tap the full potential of new technologies, the degradation and failure mechanisms must be taken into consideration at various levels of abstraction (technology, components, integrated circuits, systems) even before manufacturing. This also includes accounting for interactions between individual effects. For example, manufacturing variations and degradation affect the same properties of components.

 

ldmos_E-field

 

Image 4:

TCAD simulation of the electric field within an LDMOS structure tracking
impact ionization and resulting degradation effects.

 

 

 

 

Fraunhofer IIS/EAS offers software tools that allow for effects of malfunction or aging to be included early in the design phase via mathematical models and simulations based on them. Alongside verification of the desired electrical behavior, these techniques also make it possible to verify the function of the entire system under a variety of usage conditions. At the same time, specific constraints on the circuit design and layout can be derived in order to take the requirements for reliability and robustness into account during development of the system.

The software tools and services are primarily geared toward semiconductor manufacturers and companies running safety-critical applications which must be at once durable and economical to produce.

To find out more about Fraunhofer IIS/EAS product offerings click one of the links below:

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